Surface Characterization Lab

The Atomic Force Microscope (AFM) consists of a tiny oscillating needle that probes the surface. Scanning a predefined area generates a micrograph that depicts topography and roughness at nm-accuracy. This equipment allows for the detection and quantification of minimal changes introduced via plasma treatment.

The X-ray Photoelectron Spectroscope (XPS) is used to chemically characterize the top atomic layers of a substrate based on binding energies. Researchers using this technique can detect in a non-destructive manner what new types of functional groups are being incorporated via plasma treatment.

The Fourier-Transform InfraRed (FT-IR) spectroscopy uses an infrared laser to determine the composition of thin films and solutions via the detection of asymmetric molecular vibrations. This fast and non-destructive method gives plasma technologists the opportunity to determine the exact chemical composition of their deposited coatings.