CoCooN (Conformal Coating of Nanomaterials)

Infrastructure

Deposition and processing tools

Our research group has a broad range of deposition and processing tools available for wafers, 3D porous and non-porous substrates and particles. Most of the equipment is designed and developed in-house for a maximal degree of flexibility, while allowing for in situ characterization.

 

Atomic layer deposition

  • 10 ALD / PE-ALD reactors + 2 MLD reactors
  • In situ / in vacuo characterization: SE, FTIR, MS, OES, XPS
  • Glovebox / UHV sample transfer
  • Mobile reactor for synchrotron
  • Coating of wafers, 3D porous and non-porous, particles,…

 

Physical vapor deposition

  • 4 magnetron sputter systems (DC & RF) + 1 thermal evaporator
  • Combinatorial depositions
  • Glovebox sample handling
  • Coating of wafers and particles

 

Processing tools

  • RTA for 150 mm wafers
  • Plasma chamber for 150 mm wafers and 3D objects
  • Tube furnaces

 

Research infrastructure deposition tools

 

Characterization tools

Standard X-ray / optical / electrical characterization (ex situ)

  • XRD/XRR/XRF: Bruker D8 diffractometers with Cu and Mo sources, mapping up to 300 mm wafers
  • XPS: surface analysis mode, angle resolved mode and sputter depth profiling mode
  • Spectroscopic ellipsometry, including mapping up to 150 mm wafers
  • FTIR
  • IV/CV: automated sample mapping stage and cryogenic measurements on small samples
  • 4-point probe setup to measure electronic sheet resistance
  • Ellipsometric porosimetry

 

Electrochemical characterization

  • Commercial potentiostat/galvanostat with impedance module
  • 7 home-built potentiostats/galvanostats

 

In situ characterization during ALD/PE-ALD/MLD

  • Spectroscopic ellipsometry
  • Mass spectroscopy, Hiden HPR-30
  • Optical emission spectroscopy
  • FTIR
  • XPS (in vacuo)

 

In situ characterization during thermal annealing
(up to 1000°C, ambient selection from air, He, N2, H2, O2, CO2,… and mixtures)

  • XRD (including automated sample changer)
  • Spectroscopic ellipsometry
  • 4-point probe
  • Laser light scattering
  • Wafer curvature measurement

 

Research infrastructure characterization tools

Gloveboxes

Ar filled gloveboxes with inert sample transfer in between each other:

  • Deposition glovebox: connected to 2 ALD reactors and 1 PVD reactor
  • Electrochemical glovebox: equipped with several galvanostat/potentiostats
  • Surface analysis glovebox: connected to UHV line with ALD, XPS, SPM

 

Research infrastructure gloveboxes